Thin-Film Growth and Characterization

Thin films form the foundation of modern electronic, optoelectronic, and energy devices. From photovoltaic absorbers and transparent electrodes to functional oxides and semiconductor heterostructures, the properties of thin films strongly depend on how they are grown and how their structure and interfaces are engineered. Our research in thin-film growth and characterization focuses on understanding and controlling material formation at the nanoscale in order to enable high-performance devices.

By combining advanced deposition techniques with comprehensive structural, optical, and electrical characterization, we aim to establish clear relationships between growth conditions, microstructure, and functional properties.

Thin-Film Growth Techniques

The physical and chemical processes that occur during thin-film deposition determine the crystallinity, morphology, defect density, and interface quality of the resulting material. Our group employs a range of deposition methods tailored to specific materials and device requirements.

These may include physical vapor deposition techniques, chemical vapor deposition, solution-based processing, and hybrid approaches. Each method offers unique advantages in terms of thickness control, uniformity, scalability, and compatibility with different substrates.

We systematically investigate how parameters such as temperature, pressure, precursor chemistry, and deposition rate influence film formation. Precise control over these variables allows us to tailor grain size, phase purity, stoichiometry, and interface sharpness.

Microstructure and Morphology Control

The microstructure of a thin film—including its crystal orientation, grain boundaries, and defect distribution—plays a critical role in determining electrical and optical performance. For example, grain boundaries can act as recombination centers in photovoltaic materials, while surface roughness can influence light scattering and device integration.

Our research focuses on optimizing film morphology through controlled nucleation and growth processes. By adjusting deposition conditions and post-deposition treatments, we aim to achieve films with improved uniformity, reduced defect density, and enhanced functional properties.

We also explore heterostructures and multilayer stacks, where precise control of interfaces is essential for efficient charge transport and minimal recombination losses.

Structural Characterization

Understanding the structural properties of thin films requires advanced characterization techniques. We employ a wide range of methods to analyze crystallinity, phase composition, strain, and layer thickness.

Structural characterization enables us to identify the presence of secondary phases, quantify crystal quality, and evaluate the impact of processing conditions. By correlating structural data with device performance, we gain insights into how material properties influence efficiency and stability.

Particular attention is given to interface analysis, as many performance-limiting processes occur at boundaries between layers. High-quality interfaces are essential for efficient carrier transport and long-term reliability.

Optical and Electrical Characterization

Beyond structure, the functional performance of thin films depends on their optical absorption, band structure, carrier concentration, and mobility. We perform comprehensive optical and electrical measurements to evaluate these properties.

Optical characterization techniques help determine bandgap energies, absorption coefficients, and refractive indices, which are essential for designing optoelectronic and photovoltaic devices. Electrical measurements provide information on conductivity, carrier lifetime, defect states, and recombination mechanisms.

By combining these measurements, we can identify limiting factors in device operation and propose targeted improvements in material synthesis or device architecture.

In-Situ and Operando Studies

To gain deeper insight into growth mechanisms and material evolution, we also explore in-situ and operando characterization approaches. Monitoring film formation in real time allows us to study nucleation dynamics, phase transitions, and defect formation as they occur.

These studies provide valuable information about the fundamental processes governing thin-film growth and enable more predictive control over material properties.

From Materials to Devices

Our approach integrates thin-film synthesis with device fabrication and testing. Rather than studying materials in isolation, we evaluate their performance within functional devices such as solar cells, photodetectors, or electronic components.

This feedback loop—linking growth, characterization, and device performance—allows us to rapidly identify optimization pathways and accelerate the development of high-performance materials systems.

Research Vision

Our long-term objective in thin-film growth and characterization is to achieve precise, reproducible control over material properties at the nanoscale. By establishing clear structure–property–performance relationships, we aim to enable the rational design of advanced materials for energy and electronic applications.

Through interdisciplinary collaboration and the integration of advanced deposition and analytical tools, our research contributes to the development of next-generation thin-film technologies that combine high efficiency, reliability, and scalability.